Conditions Extrêmes et Matériaux : Haute Température et Irradiation
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2018

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A.Bachar, A.Bousquet, H.Mehdi, G.Monier, C.Robert-Goumet, L.Thomas, M.Belmahi, A.Goullet, T.Sauvage, E.Tomasella, 'Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering', Appl. Surf. Sci. 444 293-302 (2018) doi:10.1016/j.apsusc.2018.03.040

Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy:H) at 400°C by sputtering a silicon target under CH4 and N2 reactive gas mixture.Rutherford backscattering spectrometry revealed that the change of reactive gases flow rate (the ratio R=FN2/ (FN2+FCH4)) induced a smooth chemical composition tunability from a silicon carbide-like film for R= 0 to a silicon nitride-like one at R=1 with a large area of silicon carbonitrides between the two regions. The deconvolution of Fourier Transform InfraRed and X-ray photoelectron spectroscopy spectrum highlighted a shift of the chemical environment of the deposited films corresponding to the changes seen by RBS. The consequence of these observations is that a control of refractive index in the range of [1.9 – 2.5] at λ= 633 nm and optical bandgap in the range [2 eV – 3.8 eV] have been obtained which induces that these coatings can be used as antireflective coatings in silicon photovoltaic cells.