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2016
ACL
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A.Sediri, M.Zaghrioui, A.Barichard, C.Autret, B.Negulescu, L.del Campo, P.Echegut, P.Laffez, 'Growth of polycrystalline Pr2NiO4+δ coating on alumina substrate by RF magnetron co-sputtering from composite targets', Thin Solid Films 600 131-135 (2016) doi:10.1016/j.tsf.2016.01.023
Polycrystalline Pr2NiO4+δ coatings have been deposited on alumina substrates at room temperature by RF magnetron
co-sputtering fromPr and Ni metallic composite target. The mixed target's area and the sputtering conditions
were optimized to reach an atomic ratio Pr/Ni of 2. A subsequent annealing, at 1050–1100 °C, allowed
obtaining Pr2NiO4+δ phase after in situ high temperature x-ray diffraction study performed on as-deposited
film. Microstructural analyses (SEM and AFM) revealed dense and rough microstructure. Normal spectral emittance
measurements performed at 794 °C in the spectral range 400–5000 cm-1 showed an emissivity of ε≈ 0.8.
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