Conditions Extrêmes et Matériaux : Haute Température et Irradiation
CEMHTI - UPR3079 CNRS

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Publications CEMHTI


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Group by   3 records found
ACL

doi HAL  
A.Bousquet, F.Zoubian, J.Cellier, T.Sauvage, E.Tomasella, 'Control the Composition of Tantalum Oxynitride Films by Sputtering a Tantalum Target in Ar/O2/N2 Radiofrequency Magnetron Plasmas', Plasma Process. Polym., 10 990-998 (2013) doi:10.1002/ppap.201300036 - 15 citations (WoS)

ACL

doi  
E.Tomasella, L.Spinelle, A.Bousquet, F.Rebib, M.Dubois, C.Eypert, J.P.Gaston, J.Cellier, T.Sauvage, 'Structural and Optical Investigations of Silicon Carbon Nitride Thin Films Deposited by Magnetron Sputtering', Plasma Process. Polym., 6 S11-S16 (2009) doi:10.1002/ppap.200930103 - 16 citations (WoS)

ACL

doi  
F.Rebib, E.Tomasella, L.Thomas, J.Cellier, T.Sauvage, M.Jacquet, 'Study of reactive r.f. sputtering process of silicon target under Ar-O2-N2 atmospheres', Plasma Process. Polym., 4 S986-S990 (2007) doi:10.1002/ppap.200732313 - 1 citations (WoS)