CEMHTI - Conditions Extrêmes et Matériaux : Haute Température et Irradiation
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RAMAN imagery

Disorder and Optical Properties
patrick.simon@cnrs-orleans.fr  Patrick Simon   [+33](0)238 25 55 21

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introduction

these very versatile high resolution spectrometers, with its excellent spectral stability, allows accurate surface and volume cartography on sample at room temperature and at high temperature. Multivariate statistical analysis is a powerful tool for cartography analysis (composed of a huge number of individual spectra, up to a million) The new UV dedicated Qontor system allows higher temperature analysis


InVia Qontor set-up

The sample can be excited thanks to one of the 5 wavelength delivered by three lasers :

  • DPSS : 488 and 514,5 nm

  • Nd:YAG frequency tripled : 355 nm


Resolution can be fitted to the sample studied thanks to a set of 5 gratings

  • 1200 lines/mm blazed in visible region

  • 3600 lines/mm blazed in UV region



the sample analyzed size will be determined by the microscope objective power. We can choose between :

  • 5x Leica objective, NA=0,12 / WD=14mm / LR=1,5µm / AR=140µm

  • 20x Leica objective, NA=0,40 / WD=1,15mm / LR=0,8µm / AR=12,5 µm

  • 50x Leica objective, NA=0,75 / WD=0,37mm / LR=5,1µm / AR=3,6µm

  • 100x Leica objective, NA=0,85 / WD=0,33mm / LR=0,7µm / AR=2,8µm

  • 40x Thorlabs, NA=0,50 / WD=1mm

  • 15x Thorlabs, NA=0,32 / WD=8mm


InVia Reflex set-up

The sample can be excited thanks to one of the 5 wavelength delivered by three lasers :

  • DPSS : 457,9 and 514,5 nm

  • He-Ne : 633 nm

  • Laser Diode : 785 nm


Resolution can be fitted to the sample studied thanks to a set of 5 gratings

  • 600 lines/mm, one blazed in Ar/Kr region, the other one in red/IR region

  • 1200 lines/mm blazed in red/IR region

  • 1800 lines/mm

  • 2400 lines/mm blazed in Ar/Kr region



the sample analyzed size will be determined by the microscope objective power. We can choose between :

  • 5x Leica objective, NA=0,12 / WD=14mm / LR=1,5µm / AR=140µm

  • 20x Leica objective, NA=0,40 / WD=1,15mm / LR=0,8µm / AR=12,5 µm

  • 50x Leica objective, NA=0,75 / WD=0,37mm / LR=5,1µm / AR=3,6µm

  • 100x Leica objective, NA=0,85 / WD=0,33mm / LR=0,7µm / AR=2,8µm

  • 50x Olympus objective, NA=0,28 / WD=10mm


NA stands for numerical aperture,WD for working distance; AR for axial resolution and LR for lateral one



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