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2022
ACL
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Konstantina Christina Topka, Hugues Vergnes, Tryfon Tsiros, Paris Papavasileiou, Laura Decosterd, Babacar Diallo, François Senocq, Diane Samelor, Nadia Pellerin, Marie-Joëlle Menu, Constantin Vahlas, Brigitte Caussat, 'An innovative kinetic model allows insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine', Chem. Eng. J. 431 133350 (2022) doi:10.1016/j.cej.2021.133350
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