2006
ACLN
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H.Assaf, E.Ntsoenzok, M.O.Ruault, S.Ashok, 'Low-k dielectric obtained by noble gas implantation in silicon oxide', Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects | Materials Research Society Symposium Proceedings (ed. T.Y.Tsui, Y.C.Joo, L.Michaelson, M.Lane, A.A.Volinsky) 914 439-444 (2006) doi:http://www.mrs.org/s_mrs/sec_subscribe.asp?cid=6467&did=175455&action=detail
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