Conditions Extrêmes et Matériaux : Haute Température et Irradiation
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2010
ACL
doi
M.Xu, G.Regula, R.Daineche, E.Oliviero, B.Hakim, E.Ntsoenzok, B.Pichaud
,
'Effect of Si and He implantation in the formation of ultra shallow junctions in Si'
, Thin Solid Films 518 2354-2356 (2010) doi:
10.1016/j.tsf.2009.09.153