Publication list (not only @CEMHTI)
4 ACL
,
6 ACLN
,
1 Brevet
,
1 These
/
Group by
|
ACL
doi
|
H.Assaf, E.Ntsoenzok, E.Leoni, M.F.Barthe, M.O.Ruault, O.Kaitasov, S.Ashok
"Nanocavity generation in SiO2 by Kr and Xe ion implantation"
Electrochemical and Solid State Letters
10
G72-G75
[2007]
|
ACLN
doi
|
H.Assaf, E.Ntsoenzok, M.F.Barthe, E.Leoni, M.O.Ruault, S.Ashok
"Anomalous Evolution of Bubbles in Krypton-Implanted SiO2"
Semiconductor Defect Engineering-Materials, Synthetic Structures and Devices II | Materials Research Society Symposium Proceedings (ed. S.Ashok, J.Chevallier, P.Kiesel, T.Ogino)
994
125-130
[2007]
|
Brevet
|
E.Ntsoenzok, H.Assaf, M.O.Ruault
"Method of Producing a Silicon Oxide-Based Material with a Low Dielectric Constant"
Brevet
BILKO INPI 05 50253
FORT WASHINGTON, PA US
....
[2006]
|
ACLN
|
E.Ntsoenzok, H.Assaf, M.O.Ruault, S.Ashok
"Xe implantation in SiO/sub 2/: low-k applications"
Solid-State and Integrated Circuit Technology
Issue
295 - 297
[2006]
|
ACL
doi
|
H.Assaf, E.Ntsoenzok, M.F.Barthe, M.O.Ruault, T.Sauvage, S.Ashok
"Structural and nuclear characterizations of defects created by noble gas implantation in silicon oxide"
Nuclear Instruments and Methods in Physics Research Section B
253
222-226
[2006]
|
ACLN
doi
|
H.Assaf, E.Ntsoenzok, M.O.Ruault, S.Ashok
"Low-k dielectric obtained by noble gas implantation in silicon oxide"
Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects | Materials Research Society Symposium Proceedings (ed. T.Y.Tsui, Y.C.Joo, L.Michaelson, M.Lane, A.A.Volinsky)
914
439-444
[2006]
|
These
|
H.Assaf
"Hanan Assaf Etude des nano-bulles induites par l'implantation de gaz rares dans l'oxyde de silicium : applications."
These
Université d'Orléans
[2006]
|
ACL
doi
|
H.Assaf, E.Ntsoenzok
"Transfer of thin silicon layers by MeV hydrogen implantation"
Nuclear Instruments and Methods in Physics Research Section B
240
183-187
[2005]
|
ACL
doi
|
H.Assaf, E.Ntsoenzok, M.O.Ruault, O.Kaitasov
"Novel low-k dielectric obtained by Xenon implantation in SiO2"
Gettering and Defect Engineering in Semiconductor Technology Xi - Solid State Phenomena (ed. B.Pichaud, A.Claverie, D.Alquier, H.Richter, M.Kittler)
108-109
291-296
[2005]
|
ACLN
|
E.Ntsoenzok, H.Assaf, S.Ashok
"Blistering and splitting in hydrogen-implanted silicon"
Semiconductor Defect Engineering-Materials, Synthetic Structures and Devices | Materials Research Society Symposium Proceedings (ed. S.Ashok, J.Chevallier, B.L.Sopori, M.Tabe, P.Kiesel)
864
405-409
[2005]
|
|
|