Conditions Extrêmes et Matériaux : Haute Température et Irradiation

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Membres du Thème - Members

  D. Baux Staff
  A. Bellamy Staff
  P. Casero Staff
  P. Dom Staff
  W. Hate Staff
  J.L. Moreau Staff
  T. Sauvage PI
  P. Sigot Staff
  O. Wendling Staff

Faisceaux de particules
Application of Ion Beams

Responsable : Thierry Sauvage / List of Publications...

One recent publication...

2020 Jiachao Chen, Sylvain Jacques, Marie-France Barthe, Chonghong Zhang, Pierre Desgardin
'In-beam creep of SiCf/SiC minicomposites under uniaxial tensile loading'
J. Nucl. Mater. 533 152086 (2020) doi:10.1016/j.jnucmat.2020.152086

Publications des membres | member's publications
Group by   298 records found

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Konstantina Christina Topka, Babacar Diallo, Maxime Puyo, Paris Papavasileiou, Charlotte Lebesgue, Cecile Genevois, Yann Tison, Cedric Charvillat, Diane Samelor, Raphael Laloo, Daniel Sadowski, François Senocq, Thierry Sauvage, Hugues Vergnes, Marie-Joelle Menu, Brigitte Caussat, Viviane Turq, Nadia Pellerin, Constantin Vahlas
"Critical level of nitrogen incorporation in silicon oxynitride films : transition of structure and properties, towards enhanced anticorrosion performance"
ACS Applied Electronic Materials 4 1741-1755 2022


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A Hollingsworth, M.F.Barthe, M Lavrentiev, P Derlet, S Dudarev, D Mason, Z Hu, P Desgardin, J Hess, S Davies, B Thomas, H Salter, E Shelton, K Heinola, K Mizohata, A de Backer, A Baron-Wiechec, I Jepu, Y Zayachuk, A Widdowson, E Meslin, A Morellec
"Comparative study of deuterium retention and vacancy content of self-ion irradiated tungsten"
Journal of Nuclear Materials 558 153373 2022

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Konstantina Christina Topka, Hugues Vergnes, Tryfon Tsiros, Paris Papavasileiou, Laura Decosterd, Babacar Diallo, François Senocq, Diane Samelor, Nadia Pellerin, Marie-Joëlle Menu, Constantin Vahlas, Brigitte Caussat
"An innovative kinetic model allows insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine"
Chemical Engineering Journal 431 133350 2022


Chaturvedula S.Sastri, Thierry Sauvage, Gilbert Blondiaux, Olivier Wendling, Aurélien Bellamy, Christian Humburg
"Analysis of carbon in archaeological glass and pottery by low energy deuteron activation technique"
Journal of Radioanalytical and Nuclear Chemistry 329 889–897 2021

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Z.Hu, P.Desgardin, C.Genevois, J.Joseph, B.Décamps, R.Schäublin, M.F.Barthe
"Effect of purity on the vacancy defects induced in self–irradiated tungsten: A combination of PAS and TEM"
Journal of Nuclear Materials 556 153175 2021

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M.Gerardin, E.Gilabert, D.Horlait, M.F.Barthe, G.Carlot
"Experimental study of the diffusion of Xe and Kr implanted at low concentrations in UO2 and determination of their trapping mechanisms"
Journal of Nuclear Materials 556 153174 2021

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B.Diallo, K.C.Topka, Maxime Puyo, C.Lebesgue, C.Genevois, R.Laloo, Diane Samelor, H.Lecoq, M.Allix, H.Vergnes, F.Senocq, P.Florian, V.Sarou-Kanian, T.Sauvage, M.-J.Menu, B.Caussat, V.Turq, C.Vahlas, N.Pellerin
"Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate"
Journal of Materials Research and Technology 13 534-547 2021

K.Djanashvili, W.Zhang, Rosales, I.Da Silva, J.Sobilo, S.Lerondel, É.Tóth, S.Lacerda
"On the Versatility of Nanozeolite LTL for Biomedical Applications: Zirconium-89 Radiolabeling and in Vivo PET study"
Advanced Healthcare Materials submitted 2021

Eva Kovacevic, Thomas Strunskus, Neelakandan M.Santhosh, Janez Zavašnik, Wolfgang E.S.Unger, Thierry Sauvage, Mohamed-Ramzi Ammar, Uroš Cvelbar, Johannes Berndt
"Thermal stability studies of plasma deposited hydrogenated carbon nitride nanostructures"
Carbon 184 82-90 2021

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Maxime Puyo, Konstantina Christina Topka, Babacar Diallo, Raphaël Laloo, Cécile Genevois, Pierre Florian, Thierry Sauvage, Diane Samelor, François Senocq, Hugues Vergnes, Brigitte Caussat, Marie-Joëlle Menu, Nadia Pellerin, Constantin Vahlas, Viviane Turq
"Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films"
Thin Solid Films 735 138844 2021